shinephi imager
See the invisible.
Metrology for the nanoscale era.
Empowering R&D and manufacturing with real-time,
vibration-stable, sub-nanometric 3D metrology.
Quantitative Phase Metrology
shinephi imager allows for real-time, quantitative 3D mapping at the nanometer scale. Our systems capture the optical path difference, providing additional information as opposed to traditional solutions:
- Nanoscale Topography: Up to λ/1000 vertical sensitivity for ultra-precise 3D surface height profiles.
- Refractive Index (RI) Mapping: High-resolution, localized maps of refractive index variations.
- Real-Time Dynamics: Live tracking of thickness and RI changes during active processes like polymer curing.
Key Benefits
Advance your existing workflow with:
- Plug-and-Play Setup: Compatible with industry standard camera-mounts.
- High-Speed: Up to 50 fps real-time 3D mapping.
- Instant Analytics: Simultaneous intensity and phase adquisition.
Versatile Surface Metrology
Measure complex materials where traditional methods fail—no extra sample preparation required. shinephi imager enables high-accuracy profiling across diverse surfaces and internal architectures:
- Transparent & Reflective Media: High-precision measurement of glass, polymers, resins, and silicon wafers.
- Embedded Structures: Resolve 3D geometries and refractive index gradients through cladding or buried layers in a non-destructive manner.
Lab-to-Line Scalability
Maximize operational yield by bridging the gap between R&D and high-volume production. shinephi imager enables sub-nanometric vertical sensitivity at manufacturing speeds:
- Photonics & Semiconductors: In-line inspection of waveguides and nanostructures during the fabrication and instantly detect batch waste.
- Advanced Materials: Real-time polymer curing characterization.
Fast. Precise. Reliable.
shinephi imager provides λ/1000 vertical sensitivity for both laboratories and manufacturing facilities.
In-Line Speed: Captures topography data at production-line throughput, in contrast to conventional Atomic Force Microscopy (AFM) and profilometers.
Non-Destructive In-Line Testing: Replaces statistical offline sampling with real-time validation, preserving structure integrity and minimizing process waste.
High-Stability: No need for optical tables or vibration mitigations.
Optical Principle & Architecture
Standard image sensors only detect light intensity, missing the critical “delay” or phase information—the Optical Path Difference (OPD)—created when light interacts with a sample.
shinephi’s technology utilizes Lateral-shear Interferometric Microscopy (LIM) to convert these invisible phase delays into measurable intensity signals. By splitting and overlaying light beams, our system captures topography and refractive index changes with nanometric precision, transforming standard light into high-fidelity quantitative data.
Our imagers are high-performance add-on systems designed to connect directly to the output port of any existing microscope or imaging system. Utilizing a sophisticated combination of linear polarizers, Savart plates, and proprietary phase-shifting algorithms, the shinephi imager extracts 2D and 3D holograms from your sample. The result is a high-resolution (5MP) phase image that enables advanced post-processing for superior feature detection and digital refocusing.
Make it Visible: Technical Specifications
Lab precision. Production speed.
Vertical Sensitivity λ/1000
Acquisition Speed Up to 50fps
Imaging Method Single-Shot
Illumination LED compatible
Non-destructive No additional sample preparation required
Integration Plug-and-Play, C-mount compatible
Operation mode Reflection & Transmission
The invisible, made actionable.
Optical Fibers Profiling
Standard refractive index (RI) profiling requires physical cleaving, destroying sellable stock and prevents the final quality verification of finished units.
Map 3D core geometry and RI gradients directly through the cladding without compromising sample integrity. This non-destructive approach allows for continuous R&D testing cycles and maximizes production yield by enabling 100% inspection of sellable stock.
Photonic Integrated Circuits
Defects and refractive index deviations identified only post-production result in unrecoverable scrap and wasted production cycles.
Execute sub-nanometric inspection of waveguide geometry during the writing phase to enable immediate correction to prevent batch failure and maximize operational throughput.
Nanofabrication
Offline inspection masks defects until after batch completion, resulting in high scrap rates and unrecoverable material waste.
Perform instantaneous, sub-nanometric 3D profiling of height and refractive index in-situ to validate production quality during the process to eliminate waste and maintain peak operational volume.
Polymer Curing
Undetected resin transformations during irradiation lead to off-spec curing and unrecoverable batch loss.
Map refractive index and thickness shifts in-situ to ensure material spec-compliance, using instantaneous feedback during exposure to eliminate process drift and minimize scrap.
In Focus: FAQ
Technology and integration details.
How does it work?
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Which microscope brands and platforms is the module compatible with?
Our module is engineered for mechanical and optical compatibility with industry-standard inverted microscopes. It easily integrates with major commercial platforms, including Carl Zeiss, Thorlabs, Nikon, and Leica, utilizing standardized C-mount or custom adapters.
How does this technology compare to standalone metrology tools like AFMs or traditional wavefront sensors?
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We currently rely on statistical sampling and are concerned about the cost of upgrading. Is shinephi a cost-effective solution?
Yes. While traditional offline scanning setups often carry high CapEx and ongoing OpEx, Shinephi is highly cost-effective. Relying purely on statistical checking leaves your production vulnerable to undetected excursions between sampling points. Our system minimizes operational costs by requiring zero additional floor space and no specialized operators. It is a strategic investment that upgrades you from reactive sampling to continuous, real-time inspection. This gives you the certainty that every single part meets your specifications, allowing you to adjust your process on the fly with immediate feedback.
Our legacy data relies on absolute height profiles. Can your system match these metrics for historical comparison?
Absolutely. We understand the critical need to maintain consistency with your historical records. Our software can generate reconstructed absolute height profiles by mathematically integrating the differential image, providing a reliable bridge to compare current trends directly with your legacy data. However, as you transition your processes, we highly recommend utilizing our direct differential image as your new “Gold Standard” for quality control. It provides a purer, more robust measurement that eliminates the mathematical artifacts often introduced by older legacy methods.
Won't typical factory floor vibrations disrupt the precision of an interferometric measurement?
This is a very valid concern for standard legacy interferometers but shinephi’s architecture is fundamentally different. Our technology utilizes a “common-path” interferometric design, meaning the reference and object beams share the exact same optical path. As a result, any external vibration affects both beams equally and completely cancels out, making the instrument intrinsically insensitive to environmental noise.
Sub-nanometric 3D mapping at production speed.
Make it visible!